ArF LIGHT SOURCE
Oct 2005Cymer Inc.Request Info
The XLA 300, a 193-nm argon-fluoride (ArF) light source unveiled by Cymer Inc., enables volume production for 45-nm immersion photolithography applications. It offers a 6-kHz repetition rate and produces 90 W of output power. Bandwidth is <0.12 pm FWHM and <0.25 pm E95, enabling exposure of most critical features, allowing flexibility in optimizing catadioptric lens designs and supporting numerical apertures of greater than 1.3. Based on the companys master oscillator power amplifier technology, the system has a wider process window so that high-dose resists can be used without reducing throughput.