Request InfoCymer Inc.The XLA 300, a 193-nm argon-fluoride (ArF) light source unveiled by Cymer Inc., enables volume production for 45-nm immersion photolithography applications. It offers a 6-kHz repetition rate and produces 90 W of output power. Bandwidth is <0.12 pm FWHM and <0.25 pm E95, enabling exposure of most critical features, allowing flexibility in optimizing catadioptric lens designs and supporting numerical apertures of greater than 1.3. 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