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Tech Spec Excimer Laser Mirrors
Oct 2006
Edmund Optics Inc.Request Info
BARRINGTON, N.J., Oct. 24, 2006 -- Edmund Optics expands its laser mirror line with the introduction of Tech Spec High Energy Excimer Laser Mirrors. These mirrors are designed to minimize scatter from high power ultraviolet (UV) lasers, including krypton-fluoride (248 nm), xenon-chloride (308 nm) and xenon-fluoride (351 nm) lasers.

EOExcimerLaserMirror.jpg"This line of mirrors broadens the choices of optics available to excimer laser users," said Gregg Fales of Edmund Optics. "We're proud to offer our customers these mirrors with the same quality as the rest of our Tech Spec products."

The mirrors offer very low loss and high damage thresholds, as well as excellent thermal stability and low wavefront distortion, the company said. All mirrors are designed for a 45° angle of incidence and feature very low polarization dependence.
Additional mirrors are available for XeFl lasers operating even farther into the UV at 193 nm, and for beams that arrive at the mirror at a 0 angle of incidence.

The mirrors, based on thin-film dielectric coatings on fused-silica substrates, offer 10-5 surface quality, and are available in diameters of 12.5 mm and 25 mm. The mirrors are damage tested using 10-ns-long excimer laser pulses at the specified wavelengths.

For more information, visit:; e-mail:

Edmund Optics
101 E Gloucester Pike
Barrington, NJ 08007
Phone: (856) 573-6250
Toll Free: (800) 363-1992
Fax: (856) 573-6295


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Exhibiting the characteristic of materials that are electrical insulators or in which an electric field can be sustained with a minimum dispersion of power. They exhibit nonlinear properties, such as anisotropy of conductivity or polarization, or saturation phenomena.
A contraction of "excited dimer." The term refers to an excited species made by combination of two identical atoms or molecules, one of which is excited and one of which is at a ground state.
excimer laser
A rare-gas halide or rare-gas metal vapor laser emitting in the ultraviolet (126 to 558 nm) that operates on electronic transitions of molecules, up to that point diatomic, whose ground state is essentially repulsive. Excitation may be by E-beam or electric discharge. Lasing gases include ArCl, ArF, KrCl, KrF, XeCl and XeF.
A rare gas used in small high-pressure arc lamps to produce a high-intensity source of light closely resembling the color quality of daylight.
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