Request InfoNovanta IMSThe SF-100 rotational substrate stage from Intelligent Micro Patterning LLC enables precise maskless patterning on cylindrical surfaces. An add-on to the company’s maskless micropatterning system, the stage provides highly controllable and repeatable patterning of cylindrical substrates using standard photolithographical materials and techniques. Pattern features as small as 10 μm are possible with the device, which also offers low backlash, high-output torque, Windows-based operating software, and easily and quickly modifiable mounting positions.See full productRelated content from Photonics MediaWEBINARSPhotonics.com 7/20/2023Motorized and Calibrated Lenses for Machine Vision ApplicationsMany applications have benefited from motorized varifocal lenses that allow automatic or remote adjustment of focus distance and field of view. Applications may need to change the focal length or...Photonics.com 3/7/2019In Vivo Medical Laser Procedures: An OverviewThis webinar, presented by OFS, will provide an overview of current in vivo medical procedures performed using lasers and optical fibers. The presentation will begin with a brief history of...Photonics.com 6/30/2021European Photonics Manufacturing Services Funded by ECThis event is supported by the European initiatives presented and is moderated by EPIC, the European Photonics Industry Consortium. The European Commission is helping companies access the...Photonics.com 1/18/2018Fiberguide RARe Motheye Fiber: Random Anti-Reflective (RARe) Nanostructures on Optical Fibers as Replacement for AR CoatingsAnti-reflective (AR) coatings are now entering their second century and have remained virtually unchanged throughout their life. As power level and wavelength range requirements continue to increase,...