Request InfoVistec Electron Beam GmbHVistec Electron Beam GmbH has launched the SB250 electron beam lithography system for direct and midrange mask writing applications. The system operates in the standard writing modes of variable shaped beam, write-on-the-fly principle and vector scan, and in two optional modes, flexible stage speed and multipass. With automatic substrate handling and a 210 × 210-mm2 stage travel range, the system takes masks up to 7 in. and wafers up to 200 mm. Additional features include a 200-mm platform, a 50-kV high-precision shaped-beam column and up to 20 A/cm2 of current density.See full productRelated content from Photonics MediaPRODUCTSPhotonics.com 11/2/2022Area Scan CamerasThe Falcon™4-CLHS M6200 and M8200 area scan cameras from Teledyne DALSA are based on the Emerald 37M and 67M monochrome sensors. 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