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Direct-Write E-Beam System
Jul 2007
JEOL USA Inc.Request Info
PEABODY, Mass., July 16, 2007 -- JEOL USA's new high resolution direct-write e-beam lithography system complements its line of spot beam, vector scan systems and mask production tools.

The new JBX-5500FS direct-write lithography tool writes patterns at a minimum linewidth of 10 nm at 50 kV on up to 100-mm substrates. The PC-controlled operating platform features a simple graphical user interface for pattern design and machine control.

JEOL-JBX-5500FS.jpg"We are especially pleased to be able to offer this new lithography product during our 40th anniversary since the introduction of the first JEOL e-beam system," said Zane Marek, JEOL USA semiconductor equipment product manager. "JEOL prides itself on having the widest range of tools in its e-beam family of both direct-write and mask production systems," he said.

The company introduced a next-generation direct-write tool, the JBX-6300FS, for sub-10 nm linewidths at 100 kV with sub-15 nm stitching accuracy, in 2006. The first US installation of the JBX-6300FS was completed last month and the second will be completed in August, the company said.

The JBX-6300FS is capable of writing minimum linewidths of 8 nm on 2-in. to 200-mm wafers in either nanolithography or high throughput mode. The JBX-9300FS, JEOL’s production-level e-beam system, handles up to 300-mm wafers.

"The new direct-write tool (JBX-5500FS) would be an ideal choice for research labs or universities. For the past several years, there has been a void between the two most common direct-write tools -- SEMs, or scanning electron microscopes with e-beam attachments, and dedicated e-beam systems. The price gap between these levels has been too large to overcome, especially for universities," Marek said.

For more information, visit:; e-mail:

11 Dearborn Rd.
Peabody, MA 01960
Phone: (978) 535-5900
Fax: (978) 536-2205


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