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Direct-Write E-Beam System
Jul 2007
JEOL USA Inc.Request Info
PEABODY, Mass., July 16, 2007 -- JEOL USA's new high resolution direct-write e-beam lithography system complements its line of spot beam, vector scan systems and mask production tools.

The new JBX-5500FS direct-write lithography tool writes patterns at a minimum linewidth of 10 nm at 50 kV on up to 100-mm substrates. The PC-controlled operating platform features a simple graphical user interface for pattern design and machine control.

JEOL-JBX-5500FS.jpg"We are especially pleased to be able to offer this new lithography product during our 40th anniversary since the introduction of the first JEOL e-beam system," said Zane Marek, JEOL USA semiconductor equipment product manager. "JEOL prides itself on having the widest range of tools in its e-beam family of both direct-write and mask production systems," he said.

The company introduced a next-generation direct-write tool, the JBX-6300FS, for sub-10 nm linewidths at 100 kV with sub-15 nm stitching accuracy, in 2006. The first US installation of the JBX-6300FS was completed last month and the second will be completed in August, the company said.

The JBX-6300FS is capable of writing minimum linewidths of 8 nm on 2-in. to 200-mm wafers in either nanolithography or high throughput mode. The JBX-9300FS, JEOL’s production-level e-beam system, handles up to 300-mm wafers.

"The new direct-write tool (JBX-5500FS) would be an ideal choice for research labs or universities. For the past several years, there has been a void between the two most common direct-write tools -- SEMs, or scanning electron microscopes with e-beam attachments, and dedicated e-beam systems. The price gap between these levels has been too large to overcome, especially for universities," Marek said.

For more information, visit:; e-mail:

11 Dearborn Rd.
Peabody, MA 01960
Phone: (978) 535-5900
Fax: (978) 536-2205


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1. The range of frequencies or wavelengths over which radiations are absorbed or emitted in a transition between a specific pair of atomic energy levels. The full width is determined between half-power points of the line. 2. In a laser, the range of frequencies over which most of the beam energy is distributed.
1. A framelike structure that serves to restrict the viewing area of the screen whenplaced before a television picture tube. 2 In photolithography, a photomask (or mask) is typically a patterned transparent plate or an opaque plate with patterned holes or transparencies that uses a laser light source to transfer and print the pattern by an etching process onto a substrate that is typically a silicon wafer used in integrated circuitry. 
The technology of generating and harnessing light and other forms of radiant energy whose quantum unit is the photon. The science includes light emission, transmission, deflection, amplification and detection by optical components and instruments, lasers and other light sources, fiber optics, electro-optical instrumentation, related hardware and electronics, and sophisticated systems. The range of applications of photonics extends from energy generation to detection to communications and...
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