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QDI 2010 Film Microspectrophotometer

Photonics.com
Jul 2009
CRAIC TechnologiesRequest Info
 
Thin-film photovoltaic test system
SAN DIMAS, Calif., July 13, 2009 – Craic Technologies Inc. has launched the QDI 2010 Film microspectrophotometer that measures the thickness of thin films of photovoltaic cells rapidly and nondestructively. It can analyze films of many materials on both transparent and opaque substrates and enables the user to determine thin-film thickness of even microscopic sampling areas. Materials include semiconductors, microelectromechanical systems devices, disk drives and flat panel displays. Craic_PV-Test-Systsem.jpg

The device can be combined with proprietary contamination imaging capabilities and can test the transmissivity of photovoltaic cell protective covers. It combines advanced microspectroscopy with sophisticated software to enable measurement of film thickness by either transmission or reflectance of many types of materials and substrates. Sampling areas can range from more than 100 µm to less than 1 µm.

Designed for use in the production environment, it incorporates a number of easily modified metrology recipes and measures new films and sophisticated tools for analyzing data. Other features such as contamination analysis, transmissivity testing, and direct imaging and analysis of films with ultraviolet microscopy can be added to the instrument.

For more information, visit www.microspectra.com  

Craic Technologies Inc.
948 N. Amelia Ave.
San Dimas, CA 91773
Phone: (310) 573-8180
Fax: (310) 573-8182


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ConsumerCraic Technologiesdisk drivesflat panel displaysgreen photonicsimagingmetrologymicroelectromechanical systems devicesmicroscopic sampling areasMicroscopymicrospectrophotometernondestructive measurementopaque substratesphotonicsphotonics.comphotovoltaic cellsProductsQDI 2010 Filmsemiconductorsthin filmstransmission or reflectancetransparent substrates

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