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8-in. Helios Sputtering System

Photonics.com
Nov 2010
Buhler Inc., Business Area Leybold OpticsRequest Info
 
CARY, N.C., Nov. 12, 2010 — Leybold Optics USA Inc. has extended the product range for its Helios sputtering tool for optical coatings. After launching the standard 4-in. model, it is now manufacturing Helios sputtering tools that feature 12 substrate stations, each measuring 8 in. The new model offers much higher throughput.

It features up to three dual magnetrons and a radio-frequency plasma source. The substrates are placed on a turntable that rotates at 240 rpm. For use in the semiconductor industry, it is equipped with a load-and-lock system that quickly and automatically feeds in the cassettes with the substrates, keeping the chamber under vacuum. The chamber has to be opened only once a week for cleaning and exchange of targets.

A reactive magnetron evaporation process enables the system to produce coatings of high quality at high clock cycles, for optical, mechanical and electronic uses. It can accommodate conductive and nonconductive layers or a combination of both.

The optical monitoring system has a usable range from the UV to the IR. The stability of the sputtering process allows a very quick turnaround time from design to production. The optical monitoring system and the stability of the sputtering process result in highly repeatable coatings that are dense and shift-free. The sputtering tool is used in the production of polarizers, beamsplitters, notch filters and fluorescent filters.


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8-in.Americasbeamsplitterscoatingsconductivedual magnetronselectronicFiltersfluorescent filtersHELIOSindustrialLeybold Opticsload-and-lockmechanicalnonconductivenotch filtersoptical coatingsopticspolarizersProductsradio-frequency plasma sourcereactive magnetron evaporationsputteringturntableUV to IR

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