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Electron Microscope Decontaminator

Photonics.com
Apr 2011
XEI Scientific Inc.Request Info
 
REDWOOD CITY, Calif., April 13, 2011 — XEI Scientific Inc., manufacturer of the Evactron plasma cleaning system for electron microscopes and other vacuum chambers, has announced that the product can be used to clean carbon decontamination using hydrogen.

According to the company, atomic hydrogen created by the Evactron plasma is effective in cleaning carbon contamination from extreme-ultraviolet (EUV) optics. All Evactron decontaminator systems use radio-frequency plasma to produce oxygen radicals that flow downstream through the chamber, removing contamination. They also are safe for use on x-ray windows and are delivered with a five-year limited warranty and factory repair service.

For the semiconductor industry to continue making smaller features, lithographic systems are moving to shorter wavelengths such as EUV, and the very elaborate and expensive optics required may be damaged by oxygen cleaning. Using the plasma cleaning system with hydrogen gas has produced atomic hydrogen and been successful in removing hydrocarbon contamination from EUV mirrors. Cleaning rates were seen in the nanometers-per-minute range and at distances of up to 30 cm from the remote plasma source.


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