Request InfoXEI Scientific Inc.XEI Scientific Inc., manufacturer of the Evactron plasma cleaning system for electron microscopes and other vacuum chambers, has announced that the product can be used to clean carbon decontamination using hydrogen. According to the company, atomic hydrogen created by the Evactron plasma is effective in cleaning carbon contamination from extreme-ultraviolet (EUV) optics. For the semiconductor industry to continue making smaller features, lithographic systems are moving to shorter wavelengths such as EUV, and the very elaborate and expensive optics required may be damaged by oxygen cleaning....See full productRelated content from Photonics MediaPRODUCTSBioPhotonics Sep/Oct 2022 IssueAI MicroscopeThe APEXVIEW™ APX100 All-in-One Microscope from Evident Corp. provides publication-quality images for life science research. 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