Request InfoMcPHERSONMcPherson Inc. has developed the VUVaS series dual-beam scanning vacuum spectrophotometer, which measures lithography optics down to 115 nm. The test station can inspect and analyze materials and determine 193- and 157-nm laser source damage and test absorbance, transmittance and reflectance. A variable sample/detector allows the user to examine irregular or diffractive samples. The system offers interactive computer control of scans and data acquisition. Standard units accept five 1-in.-diameter samples or three 2 x 2-in. samples.See full productRelated content from Photonics MediaPRODUCTSPhotonics Spectra March 2023 IssueUV CameraThe ATX081S-UC 10GigE PoE+ UV camera from LUCID Vision Labs Inc. is equipped with the Sony 8.1-MP CMOS IMX487 global shutter sensor for capturing images across the 200- to 400-nm UV range. With...Photonics.com 5/5/2022Busbar Welding SystemThe busbar welding system from TRUMPF SE and Co. 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