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Deep-UV Lasers

Apr 2012
Teem PhotonicsRequest Info
MEYLAN, France, Jan. 3, 2012 — Teem Photonics SA has released two new deep-UV laser sources.

For applications ranging from materials ablation to laser-induced fluorescence, the 266-nm MicroChip range has been enhanced by the introduction of the SNU-20F-000 laser, increasing the average power from 2 to 12 mW and the pulse repetition rate from 6 to 20 kHz.

Multiple options such as collimation and photodiode synchronization further adapt the product to customers’ needs.

For transparent materials marking and micromachining, the PowerChip series is now extended to 266 nm with the new PNU-M01510-000. Producing more than 15 µJ with a <350-ps pulse, the laser produces >40 kW of peak power.

Both passively Q-switched subnanosecond lasers benefit from the UV Long Life Process, a proprietary process that brings deep-UV lifetime to the same realm as the lifetime of the company’s rugged infrared and green lasers.


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266-nm lasersBiophotonicsBreakthroughProductsdeep-ultraviolet lasers UV Long Life Processdeep-UV laser collimationdeep-UV laser materials ablationdeep-UV laser photodiode synchronizationdeep-UV laser transparent materials markingdeep-UV laser transparent materials micromachiningdeep-UV laser-induced fluorescenceEuropeFranceindustriallasersMicroChip SNU-20F-000 deep-UV laserpassively Q-switched lasersPowerChip PNU-M01510-000 deep-UV laserProductssubnanosecond lasersTeem Photonics

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