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Deep-UV Laser Sources

Photonics Spectra
Feb 2012
Teem PhotonicsRequest Info
 
Teem Photonics SA has unveiled two deep-UV laser sources. For applications ranging from materials ablation to laser-induced fluorescence, the 266-nm MicroChip range has been enhanced by the introduction of the SNU-20F-000 laser, increasing the average power from 2 to 12 mW and the pulse repetition rate from 6 to 20 kHz. Multiple options such as collimation and photodiode synchronization further adapt the product to customer needs. For transparent materials marking and micromachining, the PowerChip series is now extended to 266 nm with the new PNU-M01510-000. Producing more than 15 µJ with a <350-ps pulse, the laser produces >40 kW of peak power. Both passively Q-switched subnanosecond lasers benefit from the company's UV Long Life Process, which extends deep-UV lifetime.


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266-nm lasersbiophotonicsdeep-ultraviolet lasers UV Long Life Processdeep-UV laser collimationdeep-UV laser materials ablationdeep-UV laser photodiode synchronizationdeep-UV laser transparent materials markingdeep-UV laser transparent materials micromachiningdeep-UV laser-induced fluorescenceEuropeFranceindustriallasersMicroChip SNU-20F-000 deep-UV laserNew Productspassively Q-switched lasersPowerChip PNU-M01510-000 deep-UV lasersubnanosecond lasersTeem Photonics

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