Scanning Electron Microscope
Feb 2012Tescan USA Inc.Request Info
Tescan has unveiled the FERA3 XMH, a high-resolution Schottky field emission scanning electron microscope with an integrated plasma source focused ion beam (FIB). The system was developed in cooperation with Orsay Physics. Besides electron and ion columns, the microscope can be configured with gas injection systems, nanomanipulators, secondary electron and backscatter detectors, secondary ion detectors, cathodoluminescence detectors, and energy-dispersive and electron backscatter diffraction microanalyzers. The use of a xenon plasma source for the FIB allows the FERA3 to satisfy high-resolution FIB requirements (imaging) as well as to produce the high ion currents needed for ultrafast material removal rates. Applications include inspection of integrated circuit packaging, circuit edit, 3-D metrology, and defect and failure analysis.