Thin-Film Analysis Systems
Nov 2012Ocean Optics Inc.Request Info
DUNEDIN, Fla., Aug. 30, 2012 — Ocean Optics’ NanoCalc systems use spectroscopic reflectometry to determine optical thin-film thicknesses for consumer, semiconductor, medical and industrial applications. Customer-designed and application-ready preconfigured NanoCalc models make it easy to select the optimum system for deep-UV to near-IR wavelength measurement needs.
NanoCalc systems are available for a range of wavelength, sampling method and optical layer thickness requirements from 1 nm to 250 µm. Users can select among four standard models between 200 and 1700 nm and combine them with software, reflection probes, optical fibers and accessories. For applications in the visible (400 to 850 nm) or UV-visible (250 to 1050 nm), users can select preconfigured systems comprising the NanoCalc, a reflection probe and sampling stage, a calibrated Si-SiO2 five-step reference wafer, and software that analyzes up to 10 optical layers.
For more demanding applications, NanoCalc systems are available with an extensive range of add-on software, optical fibers and metrology accessories such as mapping stages and adapters for microscopes and microspot focusing objectives.
The systems are useful for applications such as transmission and reflection measurements of antireflection and hardness coatings, amorphous silicon on solar panels, OLED displays, determination of photoresist layers for photomasks, and testing the optical properties of optical coatings.
Custom systems are available, offering additional user control for in situ, multipoint and vacuum measurements. NanoCalc functions can be controlled from other software, and mapping stages can be operated with software add-ons including remote, online, mapping and multilayer options.