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PV Precision 4-Port Chamber System
May 2013
Power Vision Ltd.Request Info
CREWE, England, May 29, 2013 — Power Vision Ltd. has developed PV Precision, a four-port chamber system that can accommodate three magnetrons and a plasma source or four magnetrons. The device is suitable for low-temperature reactive or nonreactive deposition onto polymers as well as for R&D and process development.

The system enables processes such as DLC (diamondlike carbon), SiC, SiN, metals, semiconductors and TCOs (transparent conductive oxides) for multiple applications and allows for fast changes between materials. It can coat temperature-sensitive materials including CR39, polycarbonate and PET (polyethylene terephthalate).

Special substrate tooling is available for maximum coating throughput and specific component types. The device incorporates a vacuum load lock for high throughput and low maintenance. A typical nine-layer BBAR (broadband antireflection) deposit is ~20 min.

The system coats six substrates up to 100 mm² using a patented magnetron sputtering process. A highly optimized plasma source provides in situ cleaning using in-process ion bombardment.


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magnetron sputtering
A variation from standard physical vapor deposition (PVD) coating techniques, magnetron sputtering is a plasma coating process that utilizes magnetic fields to contain the plasma in front of the target in order to intensify the bombardment of ions on the target during the sputtering process. The result of magnetron sputtering is a dense plasma coating deposited on a given substrate that is placed in front of the target.
A tough, durable, heat- and cold-resistant optical quality plastic used in injection-molded items such as streetlight lenses, automotive taillights and audio compact discs.
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