Jun 2013Carl Zeiss Spectroscopy GmbHRequest Info
JENA, Germany, June 20, 2013 — The MeRiT HR II photomask repair tool from Carl Zeiss SMS GmbH offers automation and flexibility in the repair of transparent and opaque defects.
The redesigned semiconductor metrology system includes a sound automation package, enabling the seamless repair of any defect geometry, including binary, OMOG, HD MoSi and extreme UV, without the need for human interaction. Low idling time is also available to achieve higher throughput.
A security interlock option makes operator intervention possible when necessary.
For more information, visit: www.zeiss.com