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ArF Immersion Lasers

Photonics.com
Sep 2014
Gigaphoton Inc.Request Info
 
OYAMA, Japan, Sept. 29, 2014 — New argon fluoride (ArF) immersion lasers from Gigaphoton Inc. offer enhanced efficiency and output for semiconductor lithography processing.

The eGRYCOS (e-GIGAPHOTON Recycle Chamber Operation System) features a hydrodynamically optimized gas flow channel, enabling the same speed of gas flow while consuming 15 percent less electricity than earlier models.

A new pre-ionization process enables uniform distribution of ions in the main discharge region, providing laser discharge that is 1.2 times more efficient than comparable products.


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