ArF Immersion Lasers
Sep 2014Gigaphoton Inc.Request Info
OYAMA, Japan, Sept. 29, 2014 — New argon fluoride (ArF) immersion lasers from Gigaphoton Inc. offer enhanced efficiency and output for semiconductor lithography processing.
The eGRYCOS (e-GIGAPHOTON Recycle Chamber Operation System) features a hydrodynamically optimized gas flow channel, enabling the same speed of gas flow while consuming 15 percent less electricity than earlier models.
A new pre-ionization process enables uniform distribution of ions in the main discharge region, providing laser discharge that is 1.2 times more efficient than comparable products.