ArF Immersion Light Source
Dec 2014Cymer Inc.Request Info
SAN DIEGO, Calif., Dec. 1, 2014 — Cymer LLC has announced a new argon fluoride (ArF) immersion light source for advanced 14-nm chip manufacturing.
The XLR 700ix uses 15 percent less power and 50 percent less helium than earlier models.
Wavelength and energy stability enables higher scanner throughput and process stability, and tighter bandwidth control (300+5fm) essentially eliminates bandwidth as a source of process variation.