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Lithography System

Photonics.com
Jul 2015
EV Group (EVG)Request Info
 
ST. FLORIAN, Austria, July 8, 2015 — EV Group Hercules NILA fully integrated UV nanoimprint lithography system, the Hercules NIL from EVG (EV Group Europe & Asia/Pacific GmbH) combines cleaning, resist-coating and baking preprocessing steps for high-volume manufacturing of emerging photonic devices.

It imprints structures that alter or improve the optical response of surfaces and devices, such as antireflection layers, color and polarizer filters, light-guiding plates, and patterned sapphire substrates used in manufacturing LEDs, micro- and nanoelectromechanical systems (MEMS and NEMS), and other devices.

Full-area imprint coverage avoids the pattern-stitching errors commonly associated with step-and-repeat lithography systems.


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