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EUV Lithography System

Photonics.com
Oct 2015
ASML NVRequest Info
 
VELDHOVEN, Netherlands, Oct. 1, 2015 — EUV Lithography SystemASML Holding NV has announced the TWINSCAN NXT:1980Di immersion lithography system to support multiple-patterning performance requirements.

A 1.2-nm dedicated chuck overlay and 10-nm focus uniformity are featured, with new grid calibrations and hardware to enable chipmakers to achieve tighter process windows for next-generation process nodes. Throughput is improved by 10 percent to 275 wafers per hour.

The system is designed to accommodate mix-and-match use with extreme ultraviolet (EUV) lithography, achieving 2-nm matched-machine overlay.


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