Request InfoASMLVELDHOVEN, Netherlands, Oct. 1, 2015 — ASML Holding NV has announced the TWINSCAN NXT:1980Di immersion lithography system to support multiple-patterning performance requirements. A 1.2-nm dedicated chuck overlay and 10-nm focus uniformity are featured, with new grid calibrations and hardware to enable chipmakers to achieve tighter process windows for next-generation process nodes. Throughput is improved by 10 percent to 275 wafers per hour. 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