Request InfoSUSS MicroTec SEGARCHING BEI MUNCHEN, Germany, May 26, 2016 — Suss Microtec Lithography GmbH has announced the LI Laser Imaging series, a versatile surface processing platform. Process capabilities of the system range from submicron patterning of resist coated substrates to micro-ablation, photo-chemistry treatment and metrology. A lens focusing set is included in the base system. It is also possible to process small wafer pieces and add a second laser source of choice. Multiple patterning modes are available. The system is suited for academic and industrial R&D facilities. Main applications include nano- and 3D structuring for...See full productRelated content from Photonics MediaPRODUCTSPhotonics Spectra March 2024 IssueLayer Release SystemThe EVG®850 NanoCleave™ from EV Group is a system that enables nanometer-precision release of bonded, deposited, or grown layers from silicon carrier substrates. 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Since 1959, Precision Optical has earned a widely recognized reputation for reliability, value, and quality precision optics for the most demanding...Photonics Buyers' GuidePFG Precision OpticsAt PFG Precision Optics our first priority has always focused on advancing technical competence to provide superior optical products to our customers. We produce a broad offering of very high...