Cleanliness Control System
May 2016Olympus Scientific Solutions Americas, Industrial MicroscopesRequest Info
CENTER VALLEY, Pa., May 30, 2016 — Olympus Corp. has announced the CIX90 technical cleanliness control system, a dedicated turnkey system for fast, accurate and reproducible particle detection that delivers classification and reporting in accordance with international cleanliness standards.
A patented polarization method detects both reflective and nonreflective particles in a single scan. Other features include reproducible observation conditions, high-image quality, and integrated calibration and maintenance tools.
The system live processes contaminant particles ranging from 2.5 μm up to 42 mm and provides image stitching for the automatic reconstruction of large particle images.