EUV Exposure Tool
Jul 2016ASML NVRequest Info
VELDHOVEN, Netherlands, July 21, 2016 — ASML has announced the TWINSCAN NXE:3350B extreme UV (EUV) Exposure Tool.
More than 1200 wafers per day (wpd) are exposed on the NXE:3350B at a customer site, with peak performance of 1488 wpd. Five customer systems have achieved a four-week average availability of more than 80 percent.
The device prepares customers for manufacturing insertion.