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Vacuum Inlet Traps
Jan 2017
Mass-Vac Inc., MV Products Div.Request Info
NORTH BILLERICA, Mass., Jan. 17, 2017 — Vacuum Inlet TrapsA line of vacuum inlet traps and filter media for protecting vacuum pumps employed in research and production atomic layer deposition (ALD) processes has been announced by MV Products.

The traps range from 4 to 16 in with port sizes from NW-25 to ISO-160 for protecting vacuum pumps in applications with vacuum flow rates from 25 to 2000 CFM. Featuring interchangeable filter elements, the stainless steel traps can be easily customized by users to remove all ALD process byproducts from precursors such as TMA, TiCl, DeZ, and H 2 S, including particulates and unreacted precursors.

The products are suited for the ALD manufacturing of integrated circuits, MEMS, LEDs and OLEDs, optics and displays, batteries, and more.


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