UHV SPUTTERING SOURCES
May 2000Kurt J. Lesker Co.Request Info
Kurt J. Lesker Co. has developed a generation of Torus UHV sputtering sources that are compatible with vacuum systems designed to reach base pressures below 10-10 t. They have no O-rings, and the magnet assembly is removable without breaking the vacuum, allowing for 350 °C chamber bake-out. The magnet arrays can be adjusted in situ so the user can sputter both magnetic and nonmagnetic materials. The sources are suitable for magnetic storage devices, superconducting materials, semiconductor fabrication and other applications that require ultrapure thin films.