Inline Sputtering System
Apr 2017Request Info
KAHL AM MAIN, Germany, April 19, 2017 — The GENERIS PVD inline sputtering system from Singulus Technologies AG is designed for challenging transparent, conductive oxide layers such as indium tin oxide, aluminum-doped zinc oxide and Ag.
The heterojunction cell technology achieves conversion efficiencies of >22 percent, as well as reduced manufacturing costs. The system is a horizontal inline sputter tool designed for special requirements in photovoltaic high efficiency cell production. The deposited indium tin oxide layers exhibit excellent optical transmittance. Charge carrier mobility and electron density are optimized to minimize free carrier absorption in the film.
Contact layers can be deposited on the front and rear of the silicon wafers without the need to turn the wafers between coating processes and without vacuum interruption. The system provides a throughput range from 2600 to 5200 wph.