Close

Search

Search Menu
Photonics Media Photonics Buyers' Guide Photonics EDU Photonics Spectra BioPhotonics EuroPhotonics Industrial Photonics Photonics Showcase Photonics ProdSpec Photonics Handbook
More News
share
Email Facebook Twitter Google+ LinkedIn

Mask Tuning System

Photonics.com
Oct 2017
Carl Zeiss Microscopy GmbH, MicroscopyRequest Info
 
JENA, Germany, Oct. 5, 2017 — The ZEISS ForTune EUV, a novel, state-of-the-art mask tuning system for extreme UV lithography (EUV) technology from Zeiss, uses ultrashort pulse laser technology for use in both mask shops and wafer fabs.

The system has been specifically designed to support EUV lithography by improving the mask registration performance of EUV masks and wafer intrafield overlay. With its advanced technology, the ZEISS ForTune EUV enables accurate and reliable tuning process control with significantly enhanced performance by achieving >70 percent registration improvement. It reduces intrafield EUV-DUV mixed and matched overlay to the sub-nm range.

The system enables EUV mask makers and wafer fabs to tackle the registration and overlay challenges in a fast and cost-effective way.


REQUEST INFO ABOUT THIS PRODUCT

* Message:
(requirements, questions for supplier)
Your contact information
* First Name:
* Last Name:
* Email Address:
* Company:
Address:
Address 2:
City:
State/Province:
Postal Code:
* Country:
Phone #:
Fax #:

Register or login to auto-populate this form:
Login Register
* Required
ProductsZeissForTune EUVmask tuning systemlasersEurope

Terms & Conditions Privacy Policy About Us Contact Us
back to top

Facebook Twitter Instagram LinkedIn YouTube RSS
©2017 Photonics Media
x We deliver – right to your inbox. Subscribe FREE to our newsletters.
X
Are you interested in this product?
If you'd like Carl Zeiss Microscopy GmbH, Microscopy to reach out to you with more information about this product, please supply your email and they will contact you.

Email Address:
Stop showing me this for the remainder of my visit