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Mask Tuning System
Oct 2017
Carl Zeiss Microscopy GmbH, MicroscopyRequest Info
JENA, Germany, Oct. 5, 2017 — The ZEISS ForTune EUV, a novel, state-of-the-art mask tuning system for extreme UV lithography (EUV) technology from Zeiss, uses ultrashort pulse laser technology for use in both mask shops and wafer fabs.

The system has been specifically designed to support EUV lithography by improving the mask registration performance of EUV masks and wafer intrafield overlay. With its advanced technology, the ZEISS ForTune EUV enables accurate and reliable tuning process control with significantly enhanced performance by achieving >70 percent registration improvement. It reduces intrafield EUV-DUV mixed and matched overlay to the sub-nm range.

The system enables EUV mask makers and wafer fabs to tackle the registration and overlay challenges in a fast and cost-effective way.


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