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Aplanatic Objective

AdlOptica GmbHRequest Info
 
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Aplanatic ObjectiveThe aplanoXX_NA0.8 objective for diffraction limited focusing from AdlOptica GmbH features a numerical aperture of 0.8 inside transparent materials with compensation for spherical aberration at depths ranging from 0 to 4 mm.

Its high optical resistance to radiation of high power ultra-short pulse lasers with wavelengths of 515, 800, and 1030 nm, along with its optical design, are optimal for microprocessing fused silica, sapphire, glass, silicon carbide, silicon, and other materials in applications such as LED manufacturing, nanostructuring for optical data storage, and 3D micro- and nanofabrication. The aberration-free, high numerical aperture focusing is also important in various types of microscopy.

The objectives are equipped with a replaceable protective window that prevents damage of optical elements from chips and dust ejected during material processing. The aplanatic optical design guarantees low sensitivity to misalignments, which facilitates and simplifies the integration of aplanoXX objectives in existing equipment and research setups.


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ProductsAplanatic ObjectiveaplanoXX_NA0.8AdlOpticalensesnanoLEDindustrialMicroscopyopticsEurope

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