Argon Fluoride Light Source

Cymer Inc.Request Info
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SAN DIEGO, Aug. 10, 2020 — Argon Fluoride Light SourceThe XLR 960ix argon fluoride (ArF) light source from Cymer Inc. addresses chipmakers’ tight patterning requirements at advanced nodes.

An optical pulse stretcher reduces speckle to improve local critical dimension uniformity and decrease patterning defects, increasing the yield of immersion lithography systems. In order to increase wafer output, the light source also features a fifth-generation chamber module, allowing high-volume fabrications to run one year between scheduled maintenance.

The XLR 960ix includes technologies that increase availability via fewer automated calibration and gas refresh events, as well as sustainability improvements via lower power and gas consumption.

Published: August 2020
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ProductsXLR 960ixargon fluorideArFLight SourcesCymerwaferindustriallithographyAmericas

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