Atomic Layer Deposition Platform
Beneq Oy
The Beneq Transform XP from Beneq is an atomic layer deposition (ALD) platform. Its 25-wafer mini-batch reactor delivers single-digit-second cycle times for oxide and nitride films with improved uniformity and conformality. Enhanced plasma-enhanced ALD control enables low-energy ion tuning for cleaner interfaces and optimized passivation. An in-cycle annealing step densifies films to achieve low-impurity, stoichiometric materials with controlled crystalline orientation. It is suitable for the production/development of high-aspect-ratio structures and high-throughput production in wide bandgap and radio frequency applications.
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/Buyers-Guide/Beneq-Oy/c18722
Published: December 2025
From the Photonics Marketplace
Productsthin-film deposition equipmentEuropeBeneqmanufacturingRFWideband GapAtomic Layer Deposition PlatformsALD Platforms