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Atomic Layer Deposition System

Oxford Instruments Plasma Technology Ltd.Request Info
 
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The PlasmaPro ASP high-rate atomic layer deposition (ALD) research system from Oxford Instruments is designed for quantum technology and advanced R&D.

The system features a patented remote plasma source design, optimized chamber geometry, and wafer stage bias for ion energy control, resulting in a fast atomic layer deposition rate, low resistivity, and high critical temperature superconducting nitride films. Its initial application focus is quantum technology.



Published: July 2023
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ProductsPlasmaPRO ASPAtomic Layer Deposition Research SystemALDR&DOxford InstrumentsquantumEurope

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