Batch Reactor

Aixtron SERequest Info
Facebook X LinkedIn Email
The G10-AsP system from Aixtron SE enables robust, high-volume production for microLED and laser applications.

With an automated process, the arsenide-phosphide system meets the complex requirements of producing indium phosphide and vertical cavity surface emitting lasers in high volumes. The 200-mm batch reactor comes with in-situ cleaning and an automated cassette-to-cassette wafer loading. The front-end can be equipped with standard mechanical interface pods to further minimize the exposure of the epitaxial wafers to the room environment. The platform is based on planetary reactor technology that combines the multi-wafer batch reactor concept with single-wafer rotation for wafer uniformity.

Published: February 2023
* First Name:
* Last Name:
* Email Address:
* Company:
* Country:

When you click "Send Request", we will record and send your personal contact information to Aixtron SE by email so they may respond directly. You also agree that Photonics Media may contact you with information related to this inquiry, and that you have read and accept our Privacy Policy and Terms and Conditions of Use.

Register or login to auto-populate this form:
Login Register
* Required

ProductsG10-AsPAixtronDisplaysLEDsLasersBatch ReactorEurope

We use cookies to improve user experience and analyze our website traffic as stated in our Privacy Policy. By using this website, you agree to the use of cookies unless you have disabled them.