Dimension Icon SSRM-HR Microscope
Bruker Nano SurfacesRequest Info
SANTA BARBARA, Calif., April 23, 2013 — Bruker Corporation, a provider of scientific instruments and solutions for molecular and materials research, has announced the release of the Dimension Icon SSRM-HR atomic force microscope (AFM) configuration. The product includes the scanning spreading resistance microscopy (SSRM) module, designed for high-resolution semiconductor characterization.
Integrating the product’s platform with an environmental control system capable of 1-ppm gas purity and high-vacuum control, the product provides repeatability and spatial resolution in semiconductor carrier profiling; buried gate oxide layers as thin as 5 Å can be detected.
The product features the SSRM application module along with the SSRM-Dimension Icon accessory probes and environmental control. Following sample transfer from a high-vacuum sample preparation chamber, oxygen and water are controlled at the 1-ppm level during AFM imaging.
www.bruker.com
https://www.photonics.com/Buyers_Guide/Bruker_Nano_Surfaces/c24688
Photonics.com
Apr 2013
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