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EUV Light Source

Energetiq Technology Inc.Request Info
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WOBURN, Mass., Sept. 26, 2012 — Energetiq Technology Inc. has announced its EQ-10HP 20-W extreme-ultraviolet (EUV) light source for actinic inspection of EUV masks.

It operates at substantially higher input powers than its EQ-10 series predecessors and delivers 20 W of in-band EUV into 2 pi steradians. Its small, stable, inductively driven plasma makes it suitable for use in EUV metrology and inspection applications, and its modular design facilitates integration into a process tool.

 The system includes the proprietary and patented Electrodeless Z-pinch source assembly, vacuum and gas subsystems, a power delivery subsystem and control electronics.
Sep 2012

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20-W EUV light sourceactinic inspectionAmericasElectrodeless Z-pinchEnergetiq TechnologyEQ-10HPEUV inspectionEUV masksEUV metrologyextreme-ultraviolet light sourceinductively driven plasmalight sourcesMassachusettsmetrologyNew ProductsProductsTest & Measurement

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