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Flexible Workstation

Carl Zeiss Ltd.Request Info
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PEABODY, Mass., March 26, 2009 – Carl Zeiss SMT has introduced its Auriga CrossBeam focused ion beam/scanning electron microscopy (FIB/SEM) workstation. To characterize samples on the nanometer scale, it performs chemical analysis and provides complete morphology and crystallographic and electrical information.

Zeiss_Workstation.jpgThe workstation has a redesigned vacuum chamber that includes 15 ports for different detectors. The charge compensation system enables local application of an inert gas flush so that electrostatic charging of nonconductive samples is neutralized, and detection of secondary and backscattered electrons is possible. Such analytical methods as energy dispersive spectroscopy, electron backscatter diffraction and secondary ion mass spectrometry benefit from this technology, supporting numerous applications in materials analysis, life sciences and semiconductors.

At the heart of the workstation is the Gemini field-emission SEM column. Its in-lens detector produces images with good material contrast, and the design of the column enables analysis of magnetic samples. The system performs simultaneous milling and high-resolution SEM imaging, and it incorporates a high-resolution FIB with a top level resolution of 2.5 nm or better. Advanced gas processing technology for ion- and electron-beam-assisted etching and deposition completes the sample processing capabilities.

The system can be upgraded to meet changing needs.

For more information, visit:

Carl Zeiss SMT
1 Corporation Way
Peabody, MA 01960
Phone: (978) 826-1500
Mar 2009
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15-port vacuum chamberAurega CrossBeamBiophotonicsCarl Zeisscharge compensation systemelectron-beam-assisted etchingfocused ion beam/scanning electron microscopy workstationion-beam-assisted etchinglife sciencesmaterials analysisMicroscopynanometer characterizationphotonicsProductssemiconductorsSensors & Detectorsspectroscopy

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