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IR Coating Technology

Photonics.com
Aug 2018
Dynasil Corp. of AmericaRequest Info
 
NEWTON, Mass., Aug. 30, 2018 — A new plasma-enhanced chemical vapor deposition (PE-CVD) IR coating technology from Dynasil Corp. of America was produced by a diamond-like coating chamber.

With highly precise and reliable next-generation techniques that up-coat, the DLC chamber makes pinholes virtually nonexistent. Additionally, the new PE-CVD IR coating technology results in a much more robust and higher-quality product.

The new chamber gives Dynasil the capability to coat virtually all IR substrates, including germanium, silicon, zinc selenide, zinc sulfide, fused silica, and chalcogenides.


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Productsplasma-enhanced chemical vapor depositionPE-CVDIR coating technologyDynasil Corp. of America

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