Light Sources

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OYAMA, Japan, April 6, 2020 — Gigaphoton Inc. has announced two new light sources for use in semiconductor lithography.

The GT66A ArF immersion laser is equipped with a newly developed optical module to reduce spatial coherence and improve beam uniformity on the exposed surface.

The G60K KrF light source has undergone a full model change, increasing power output by a factor of 1.5× compared to the existing model by introducing a new power supply unit.

Published: April 2020
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ProductsGigaphotonGT66A ArFG60K KrFLight SourcesLaserssemiconductor lasersOpticsAsia-Pacific

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