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Lithography System

Nikon Corp., Digital Solutions Business UnitRequest Info
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The NSR-S625E argon fluoride (ArF) immersion scanner from Nikon Corp. is optimized for middle critical layers.

The lithography system provides enhanced throughput and operational stability for the efficient production of semiconductor devices. It features a resolution of 38 nm, a numerical aperture of 1.35, and a 193-nm wavelength excimer laser light source.

Photonics Spectra
Aug 2023
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ProductsNSR-S625Eargon fluorideNikonArFimmersion scannerlithography systemlasersAsia-Pacific

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