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NESSY 1900

Buhler Inc., Business Area Leybold OpticsRequest Info
 
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NESSY 1900Advanced sputtering system for x-ray mirrors for EUV lithography.

• DC or DC pulsed sputtering coating technology.

• Mo, Si, Cr, Sc, and different materials for diffusion-barrier layers and capping layers.

• Sputter source: Up to 6 PK; 600 × 125 mm.

• Base pressure: 9 × 10–9 mbar.

• Planetary-drive speed: 0–5 rpm.

• Rotation-table speed: 0–500 rpm.

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