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Nanoimprint and Wafer-level Optics System

EV Group (EVG)Request Info
 
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ST. FLORIAN, Austria, Feb. 7, 2022 — Nanoimprint and Wafer-level Optics SystemThe EVG®7300 automated SmartNIL® nanoimprint and wafer-level optics system from the EV Group combines multiple UV-based process capabilities such as nanoimprint lithography, lens molding, and lens stacking in a single platform.

The multifunctional system is designed to serve advanced R&D and production needs for a wide range of emerging applications involving micro- and nanopatterning as well as functional layer stacking. These include wafer-level optics, optical sensors and projectors, automotive lighting, waveguides for augmented reality headsets, biomedical devices, meta-lenses and meta-surfaces, and optoelectronics. Supporting wafer sizes up to 300 mm and featuring high-precision alignment, advanced process control, and high throughput, the EVG7300 meets the high-volume manufacturing needs for a variety of freeform and high-precision nano- and micro-optical components and devices.


Photonics.com
Feb 2022
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ProductsEVG7300Nanoimprint and Wafer-level Optics SystemEV GroupnanoopticswaferlensesR&DindustrialSensors & Detectorslight sourcesautomotiveBiophotonicsmedicinemedicaloptoelectronicsEurope

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