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Nanoimprinting Platform

MorphotonicsRequest Info
 
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Nanoimprinting PlatformThe Portis1100 standalone proprietary R2P nanoimprinting platform from Morphotonics BV can imprint at 1100 × 1300-mm GEN5 substrate sizes.

Ideal for R&D, process development, and pilot-high volume production of micro- and nanostructures for a variety of applications, the Portis1100 offers cost advantages and ease in changing flex-stamps with the adjusting key nanoimprinting process parameters like speed, pressure, gap, and UV settings. It is compatible with various pretreatment and coating machines.

Uses include new display technologies, novel lighting concepts, efficient solar solutions, and life science products, among others.

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Photonics Spectra
Nov 2020
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