Search
Menu

Nanoimprinting Platform

MorphotonicsRequest Info
 
Facebook X LinkedIn Email
Nanoimprinting PlatformThe Portis1100 standalone proprietary R2P nanoimprinting platform from Morphotonics BV can imprint at 1100 × 1300-mm GEN5 substrate sizes.

Ideal for R&D, process development, and pilot-high volume production of micro- and nanostructures for a variety of applications, the Portis1100 offers cost advantages and ease in changing flex-stamps with the adjusting key nanoimprinting process parameters like speed, pressure, gap, and UV settings. It is compatible with various pretreatment and coating machines.

Uses include new display technologies, novel lighting concepts, efficient solar solutions, and life science products, among others.



Published: September 2020
REQUEST INFO ABOUT THIS PRODUCT
* First Name:
* Last Name:
* Email Address:
* Company:
* Country:
Message:


When you click "Send Request", we will record and send your personal contact information to Morphotonics by email so they may respond directly. You also agree that Photonics Media may contact you with information related to this inquiry, and that you have read and accept our Privacy Policy and Terms and Conditions of Use.

Register or login to auto-populate this form:
Login Register
* Required

ProductsPortis1100nanoimprinting platformnanoMorphotonicsR&DLight SourcesdisplayphotovoltaicsBiophotonicsEurope

We use cookies to improve user experience and analyze our website traffic as stated in our Privacy Policy. By using this website, you agree to the use of cookies unless you have disabled them.