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Ohara Corp. - Optical Glass, Polish substrates 2024 LB

OCD Metrology Platform

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OCD Metrology Platform. Courtesy of Onto Innovation.The Atlas G6 optical critical dimension (OCD) metrology system from Onto Innovation is designed for process control in advanced semiconductor nodes. The Atlas G6 system features accuracy and the small spot size needed to support precision in controlling individual nanowire measurements in GAA and smaller DRAM cell block sizes for high bandwidth memory. The system introduces an additional data channel, which, when combined with Onto’s proprietary AI Diffract OCD analysis software and model-guided machine learning algorithms, strengthens and shortens time to solution.


Published: September 2025




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Productsquality control and inspection systemsOnto InnovationmetrologysemiconductorsTest & Measurement

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