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Photolithography Systems

Eulitha AGRequest Info
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Photolithography SystemsThe PhableX line of photolithography systems from Eulitha AG is designed for the high-volume production of photonic products.

The systems operate on the displacement talbot lithography (DTL) principle and enable high-throughput, automatic operation. DTL is particularly suited to tackle the needs of the photonics industry thanks to its ability to print stitching-free patterns over large-areas. Patented focus-free imaging enables uniform printing on nonflat substrates, and its noncontact method greatly reduces process complexity, device defectiveness, and yield loss.

The PhableX platform is offered with industry-standard light sources including i-line, krypton fluoride, and argon fluoride sources, depending on resolution requirements. Feature sizes between 60 nm and several μm can be printed using the same photoresist products developed for the manufacturing of semiconductor devices. The platform is currently available for wafer sizes between 100 to 200 mm. The systems can be used for waveguides in augmented or virtual reality glasses, distributed feedback lasers, telecom gratings, or optical biosensors, among other items.

Winter 2020

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ProductsPhableXphotolithography systemsEulithalight sourcesopticsthin filmmaterialssemiconductorslasersCommunicationsBiophotonicsEurope

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