Photomask Repair Equipment

Park Systems Corp.Request Info
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SEOUL, South Korea, Nov. 18, 2022 — Photomask Repair EquipmentPark NX-Mask photomask repair equipment from Park Systems Corp. supports dual pods for handling extreme UV masks on inline production.

The all-in-one solution provides auto defect review to repair of defects and verification of the repair, accelerating throughput at a high efficacy. It removes defects and foreign particles with nm accuracy and angstrom level precision of the edge placement. It does not disturb the reflective surface pattern or spurious depositions including stains and implanted elements.

Published: November 2022
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ProductsPark NX-Maskphotomask repair equipmentOpticsPark SystemsindustrialSensors & DetectorsAsia-Pacific

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