Request InfoGigaphoton Inc.New argon fluoride (ArF) immersion lasers from Gigaphoton Inc. offer enhanced efficiency and output for semiconductor lithography processing. The eGRYCOS (e-GIGAPHOTON Recycle Chamber Operation System) features a hydrodynamically optimized gas flow channel, enabling the same speed of gas flow while consuming 15 percent less electricity than earlier models. A new pre-ionization process enables uniform distribution of ions in the main discharge region, providing laser discharge that is 1.2 times more efficient than comparable products.See full productRelated content from Photonics MediaPRODUCTSPhotonics Spectra January 2023 IssueSide-Pumped ModulesThe SP17 and SP18 high-power side-pumped modules from Focuslight Technologies Inc. offer peak powers of 30 and 5 kW, respectively. 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