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ArF Immersion Light Source

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Cymer Inc.
SAN DIEGO, Calif., Feb. 24, 2015 — A new ArF immersion light source for semiconductor lithography from Cymer provides improvements in bandwidth, wavelength and energy stability to reduce process variability and increase yield over previous models. The XLR 700ix enables higher scanner throughput and process stability for 14-nm chip manufacturing and other applications. It offers improvements in wafer critical dimension (CD) uniformity, software enhancements to increase light source predictability, and availability and reduction in helium and power consumption to decrease operating costs. Cymer has also introduced...See full product

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