Request InfoCymer Inc.SAN DIEGO, Aug. 10, 2020 — The XLR 960ix argon fluoride (ArF) light source from Cymer Inc. addresses chipmakers’ tight patterning requirements at advanced nodes. An optical pulse stretcher reduces speckle to improve local critical dimension uniformity and decrease patterning defects, increasing the yield of immersion lithography systems. In order to increase wafer output, the light source also features a fifth-generation chamber module, allowing high-volume fabrications to run one year between scheduled maintenance. The XLR 960ix includes technologies that increase availability via fewer automated...See full productRelated content from Photonics MediaPRODUCTSPhotonics Spectra August 2023 IssueLithography SystemThe NSR-S625E argon fluoride (ArF) immersion scanner from Nikon Corp. is optimized for middle critical layers. 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