Request InfoCymer Inc.The XLA 105 argon-fluoride excimer light source manufactured by Cymer Inc. is designed to support 65-nm photolithography applications. Based on proprietary master oscillator power amplifier dual-gas-discharge-chamber technology, it is intended for volume production of semiconductor devices. It operates at a 4-kHz repetition rate and delivers 40 W of output to provide full imaging capability for 200- and 300-mm lithography scanners. Bandwidth is ≤0.2 pm FWHM and ≤0.50 pm at 95% energy integral. Pulse duration is ≥=70 ns, reducing peak fluence and increasing the lifetime of...See full productRelated content from Photonics MediaPRODUCTSPhotonics Spectra April 2023 IssueTime-of-Flight CMOS Image SensorThe Hydra3D+ Time-of-Flight (ToF) CMOS image sensor from Teledyne e2v Ltd. incorporates 832 × 600-pixel resolution for versatile 3D detection and measurement. 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From an optical manufacturer's perspective,...Photonics.com 8/24/2023DayOptics Spirit--All is For Offering the Best Lenses to YouFor more information, please follow our SOCIALS: Linkedin YoutubeFacebook Twitter Website EmailPHOTONICS BUYERS' GUIDE CATEGORIESDiode-Pumped Solid-State LasersA diode-pumped solid-state laser is a type of laser system that uses semiconductor diode lasers to pump energy into a solid gain medium, resulting in the generation of coherent light. This technology...Electronic Design Automation SoftwareArea-Scan CamerasArea scan, in the context of imaging and cameras, refers to a method of capturing an entire two-dimensional image in a single snapshot or exposure.Robotic Consulting ServicesCOMPANIESPhotonics Buyers' GuideLaCroix Precision OpticsThe LaCroix name is synonymous with quality precision optics. 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